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19 August 1996 Dual ion beam sputtering deposition of silicon oxynitride thin films
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Abstract
The dependence of the silicon oxynitride (SiOxNy) refractive index on chemical composition can be employed in producing graded refractive index optical coatings. In this work, SiOxNy thin films were deposited by dual ion beam sputtering. Samples with different composition were obtained by making use of SiO2 and Si targets. The energy and the ion to atom arrival ratio were also varied to study the correlation with the film stoichiometry. Infrared spectroscopy of the vibrational modes was used to investigate the composition of the samples. X-ray photoelectron spectroscopy and x-ray induced auger electron spectroscopy were combined to provide further insight into the chemical composition of the films.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Francesca Sarto, Antonella Rizzo, Rossella Giorgi, S. Turtu, and Salvatore Scaglione "Dual ion beam sputtering deposition of silicon oxynitride thin films", Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); https://doi.org/10.1117/12.246825
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