Pd-based films produced by PECVD for optical recording

Konstantin P. Gritsenko

doi:10.1117/12.246834

19 August 1996 Pd-based films produced by PECVD for optical recording

Konstantin P. Gritsenko

Proceedings Volume 2776, Developments in Optical Component Coatings; (1996) https://doi.org/10.1117/12.246834
Event: Optical Instrumentation and Systems Design, 1996, Glasgow, United Kingdom

Abstract

Plasma enhanced chemical vapor deposition is a novel process to produce metal-filled polymer films. Both bis-allyl-Pd-Cl and allyl-Pd-pentacyclodienyl precursors were used. In conditions dependent on precursor, pressure, electrical power, voltage, frequency and substrate temperature films of different chemical structure and morphology were obtained. Transparent films and absorptive amorphous ones were deposited. Film structure could be both mixture of particles and Pd particles surrounded by organic matrix. The complicated structure of organic part of Pd-based films can be explained by some chemical syntheses taking place during plasma process. The film sensitivity to laser irradiation and writing threshold dependent not only on Pd content but also on phases distribution morphology. Film sensitivity correlates with its electrical resistivity. Thermal stability correlates with cross-links quantity. Pd particles were not oxidized under 450 degrees C annealing.

Citation Download Citation

Konstantin P. Gritsenko "Pd-based films produced by PECVD for optical recording", Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); https://doi.org/10.1117/12.246834

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