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19 August 1996 Plasma-ion-assisted deposition: investigation of film stress
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Abstract
In many applications in the field of optical coatings low dimensions and low weight of the substrates are of increasing importance. Organic substrate materials or thin glass substrates are used in many cases. Due to the low mechanical stability, these substrates are very sensitive against bending caused by the stress of the coatings. The stress of optical coatings deposited with plasma-IAD with the APS (advanced plasma source) was investigated. Based on the bending radius of coated thin glass substrates stress values were evaluated. It was found, that film stress can be influenced significantly with the deposition parameters and the use of the coating starting materials. The results of single layer coatings of various dielectric materials and completed multilayer systems are given.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alfons Zoeller, Rainer Goetzelmann, and K. Matl "Plasma-ion-assisted deposition: investigation of film stress", Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); https://doi.org/10.1117/12.246816
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