19 August 1996 SiO2 protective coatings on plastic optics deposited with plasma IAD
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Abstract
Plasma ion assisted deposition was used to deposit SiO2 coatings on polycarbonate and on silicon. To study the influence of ion bombardment during the deposition process the bias voltage as an equivalent for ion energy was varied. At a definite bias value surface microtopography is changed abruptly. Coatings deposited at higher bias voltages show a stable chemical composition and therefore constant optical properties can be expected. It was also found that the barrier effect of coatings against moisture uptake, measured for polycarbonate substrates, increases with bias voltage.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ulrike Schulz, Stefan Jakobs, Norbert Kaiser, "SiO2 protective coatings on plastic optics deposited with plasma IAD", Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); doi: 10.1117/12.246810; https://doi.org/10.1117/12.246810
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