1 September 1996 Multiple aperture imaging system for lithography
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Proceedings Volume 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology; 277804 (1996) https://doi.org/10.1117/12.2298886
Event: 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 1996, Taejon, Korea, Republic of
Abstract
An optical system will be presented which uses a stack of microlens arrays for the 1:1 imaging of extended object planes. The system is based on the well-known concept of multiple aperture imaging. A compact imaging system was discovered which is remarkable in that it provides a diffraction limited resolution of 3 μm free of distortion and magnification errors for large object and image areas. 5 μm resolution was demonstrated by using melting resist microlens arrays.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Völkel, "Multiple aperture imaging system for lithography", Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 277804 (1 September 1996); doi: 10.1117/12.2298886; https://doi.org/10.1117/12.2298886
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