1 September 1996 Multiple aperture imaging system for lithography
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Proceedings Volume 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology; 277804 (1996) https://doi.org/10.1117/12.2298886
Event: 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 1996, Taejon, Korea, Republic of
Abstract
An optical system will be presented which uses a stack of microlens arrays for the 1:1 imaging of extended object planes. The system is based on the well-known concept of multiple aperture imaging. A compact imaging system was discovered which is remarkable in that it provides a diffraction limited resolution of 3 μm free of distortion and magnification errors for large object and image areas. 5 μm resolution was demonstrated by using melting resist microlens arrays.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Völkel, R. Völkel, } "Multiple aperture imaging system for lithography", Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 277804 (1 September 1996); doi: 10.1117/12.2298886; https://doi.org/10.1117/12.2298886
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