1 September 1996 Catadioptric systems for sub-quarter micron lithography
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Proceedings Volume 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology; 277805 (1996) https://doi.org/10.1117/12.2298887
Event: 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 1996, Taejon, Korea, Republic of
Abstract
Nowadays, ArF excimer laser projection lithography has been spot lighted due to its potential high resolution applicable to 1 G Bit DRAMs( < 0.2μm design rule ). The unique refractive material in ArF excimer laser lithography is fused silica and there is no way to correct the chromatic aberration by combination of different materials. Hence, the catadioptric configuration is inevitable in this field.[1, 2]
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kag Hyeong Lee, Kag Hyeong Lee, "Catadioptric systems for sub-quarter micron lithography", Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 277805 (1 September 1996); doi: 10.1117/12.2298887; https://doi.org/10.1117/12.2298887
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