1 September 1996 Optical imaging of small structures in optical lithography: high focal depth with optical filters.
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Proceedings Volume 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology; 277814 (1996) https://doi.org/10.1117/12.2298922
Event: 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 1996, Taejon, Korea, Republic of
Abstract
The main goal in photolithography is to produce smaller and smaller structures with high Depth of Focus (DOF). In this contribution the image intensity of small isolated structures is studied under the influence of nonuniform pupils. Special interest is dedicated to axial apodizing filters, which produce high DOF with sufficient small line width. The influence of partial coherent illumination has been taken into account.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Hild, "Optical imaging of small structures in optical lithography: high focal depth with optical filters.", Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 277814 (1 September 1996); doi: 10.1117/12.2298922; https://doi.org/10.1117/12.2298922
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