1 September 1996 Characterization of silica-based waveguide layers for integrated optics application
Author Affiliations +
Proceedings Volume 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology; 27782I (1996) https://doi.org/10.1117/12.2298972
Event: 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 1996, Taejon, Korea, Republic of
Abstract
Sensitive and simple methods to examine the quality of waveguide layers, such as in-plane scattering method and laser beam scattering method, are newly introduced. We apply this methods to evaluate the silica-based CVD and FHD waveguides layers and compare these methods with others such as the stylus scan measurement of the surface, the interferometric test of waveguide layer, and the measurement of propagation loss. The Fl-ID waveguide generally shows higher loss with more surface waviness than the CVD waveguide, which comes from the different nature of the FHD process. The quality of the best optimized FHD wafer aproaches that of the CVD wafer, but depends highly on the process condition.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hyung Jong Lee, Hyung Jong Lee, "Characterization of silica-based waveguide layers for integrated optics application", Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 27782I (1 September 1996); doi: 10.1117/12.2298972; https://doi.org/10.1117/12.2298972
PROCEEDINGS
2 PAGES


SHARE
Back to Top