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1 September 1996 Low temperature consolidation of flame-hydrolysis-deposited silica layer for integrated optics application
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Proceedings Volume 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology; 2778D3 (1996) https://doi.org/10.1117/12.2316160
Event: 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 1996, Taejon, Korea, Republic of
Abstract
A flame-hydrolysis-deposited silica layer is produced and consolidated at low temperature as 850°C. The concentration of boron oxide in the layer is measured to be 13∼15 mole %. Such a low temperature consolidation process of the flame hydrolysis deposition (FHD) layer allows hybridization between the RID and chemical vapor deposition (CVD) method. For example, a CVD phosphosilicate waveguide is covered with the FHD highly-boron-doped silica layer and its properties are examined. The upper cladding (to 24 μm) is successfully deposited in one step and showed good filling capability of the gap between the waveguides. The refractive index of this layer is low (1.453) compared to that of the high pressure steam oxide (1.457). Insertion loss of the 32 mm long sample annealed at 1000°C is 1.13 dB and the propagation loss is estimated as 0.1 dB/cm or better.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yong Tae Lee "Low temperature consolidation of flame-hydrolysis-deposited silica layer for integrated optics application", Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 2778D3 (1 September 1996); https://doi.org/10.1117/12.2316160
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