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1 September 1996 Measurement of the double layer-capacitance of aluminium samples by holographic interferometry
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Proceedings Volume 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology; 2778F6 (1996) https://doi.org/10.1117/12.2316235
Event: 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 1996, Taejon, Korea, Republic of
Abstract
In the present investigation, holographic interferometry was utilized for the first time to measure the double layer-capacitance of aluminium samples during the initial stage of anodization processes in aqueous solution without any physical contact. The anodization process (oxidation) of the aluminium samples was carried out chemically in different acid concentrations (0.5-3.125 % H2SO4) at room temperature. In the mean time, a method of holographic interferometric was used to measure the thickness of anodization (oxide film) of the aluminium samples in aqueous solutions. A long with the holographic measurement, a mathematical model was derived in order to correlate the duoble layer-capacitance of the aluminium samples in solutions to the thickness of the oxide film of the aluminium samples which forms due to the chemical oxidation. The thickness of the oxide film of the aluminium samples was measured by the real time-holographic interferometry . Consequently, holographic interferometric is found very useful) for surface finish industries especially for monitoring the early stage of anodization processes of metals , in which the thickness of the anodized film can be measured as well as the duoble layer-capacitance of the aluminium samples can be determined during the anodization processes.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K. Habib "Measurement of the double layer-capacitance of aluminium samples by holographic interferometry", Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 2778F6 (1 September 1996); https://doi.org/10.1117/12.2316235
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