8 April 1996 Fabrication of silicon microtips
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Proceedings Volume 2780, Metal/Nonmetal Microsystems: Physics, Technology, and Applications; (1996) https://doi.org/10.1117/12.238193
Event: Metal/Nonmetal Microsystems: Physics, Technology, and Applications, 1995, Polanica Zdroj, Poland
Abstract
In the article, the results of investigation of the silicon microtips manufacturing process are presented. A two-stage technology of the microtips forming has been worked out. At the first stage, a single-micrometer high, suitably shaped precursor of the tip is done. Next, the process of its sharpening is performed, using the isotropic etching and thermal oxidation techniques. The arrays of the reproducible silicon microtips were fabricated.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anna Gorecka-Drzazga, Anna Gorecka-Drzazga, Jan Dziuban, Jan Dziuban, } "Fabrication of silicon microtips", Proc. SPIE 2780, Metal/Nonmetal Microsystems: Physics, Technology, and Applications, (8 April 1996); doi: 10.1117/12.238193; https://doi.org/10.1117/12.238193
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