Plasma formation of thin alumina films

Stanislov Novak; Rudolf Hrach; Jaroslav Pavlik; Vera Hrachova

doi:10.1117/12.238127

8 April 1996 Plasma formation of thin alumina films

Stanislov Novak, Rudolf Hrach, Jaroslav Pavlik, Vera Hrachova

Proceedings Volume 2780, Metal/Nonmetal Microsystems: Physics, Technology, and Applications; (1996) https://doi.org/10.1117/12.238127
Event: Metal/Nonmetal Microsystems: Physics, Technology, and Applications, 1995, Polanica Zdroj, Poland

Abstract

An oxidation of aluminum films in oxygen plasma of dc glow discharge is studied by computer experiment. The necessary data is derived from direct measurements. The complete model consists of three parts -- the modeled source of the oxygen plasma, the model of the transport of charged particles through the sheath between undisturbed plasma and substrate and, finally, the description of physical processes occurring during oxide formation on the solid surface. The description of volume interactions which takes part in the undisturbed plasma was based on a macroscopic kinetic approach with 12 kinds of charged or excited particles. As a result of the first part of the model the steady-state concentrations of all kinds of particles were derived. These results are used as input data for the second part of the model, which is the main task of the present paper. The physical processes which take part in the interaction of plasma- aluminum substrate were analyzed by the iterative hybrid method -- a combination of molecular dynamics and Monte Carlo approaches. This method was employed to study the transport of charge in the self-consistent electric field under the influence of interactions with neutral species in the sheath. Both the plasma oxidation and plasma anodization were modeled and the effects of varying bulk plasma and sheath parameters on the ion and electron distributions at aluminum surface were examined. These particles can be used in the third part of the complete model to analyze the growth of alumina film.

Citation Download Citation

Stanislov Novak, Rudolf Hrach, Jaroslav Pavlik, and Vera Hrachova "Plasma formation of thin alumina films", Proc. SPIE 2780, Metal/Nonmetal Microsystems: Physics, Technology, and Applications, (8 April 1996); https://doi.org/10.1117/12.238127

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