Paper
18 September 1996 Lithography on PMMA-DR1 with reflection near-field optical microscopy (R-SNOM) and probe characterization
Stephane Davy, G. Rachard, Michel Spajer
Author Affiliations +
Proceedings Volume 2782, Optical Inspection and Micromeasurements; (1996) https://doi.org/10.1117/12.250784
Event: Lasers, Optics, and Vision for Productivity in Manufacturing I, 1996, Besancon, France
Abstract
We propose a method of scanning near field optical lithography where the result of the process is controlled in quasi real time. Irradiation of the polymer involves a topographic modification of the layer. It is detected mechanically by the fiber tip, which plays the role of a nanosource and of shear force probe. A single snapshot gives an image of the intensity distribution around the tip. A resolution better than 100 nm is obtained even with dielectric tips.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephane Davy, G. Rachard, and Michel Spajer "Lithography on PMMA-DR1 with reflection near-field optical microscopy (R-SNOM) and probe characterization", Proc. SPIE 2782, Optical Inspection and Micromeasurements, (18 September 1996); https://doi.org/10.1117/12.250784
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KEYWORDS
Lithography

Optical microscopy

Dielectrics

Near field

Optical lithography

Polymers

Process control

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