Paper
26 August 1996 One-level gray-tone lithography: mask data preparation and pattern transfer
Klaus Reimer, Hans Joachim Quenzer, Rita Demmeler, Bernd Wagner
Author Affiliations +
Proceedings Volume 2783, Micro-Optical Technologies for Measurement, Sensors, and Microsystems; (1996) https://doi.org/10.1117/12.248506
Event: Lasers, Optics, and Vision for Productivity in Manufacturing I, 1996, Besancon, France
Abstract
This paper reports on a methodology for fabrication of arbitrarily shaped structures using technologies common to standard IC manufacturing processes. Particular emphasis is put on the design and use of halftone transmission masks for the lithography step required in the fabrication process of mechanical, optical or electronics components. The algorithms to transfer an initial height profile into a design representation in the common data format GDSII are discussed. This set of data could be used directly by a commercial mask shop. The great data amount of a reticle layout has been reduced significantly by a first order data compaction. The possibly nonlinear influences of the different process steps on the transfer function have been regarded. The specific parameters for the mask making and the resist process are determined. Several components like shaped gratings or lenses have been realized in resist up to 10 micrometers thick. In the field of transferring the pattern into a substrate material like silicon or glass, a dry etching process was evaluated.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Klaus Reimer, Hans Joachim Quenzer, Rita Demmeler, and Bernd Wagner "One-level gray-tone lithography: mask data preparation and pattern transfer", Proc. SPIE 2783, Micro-Optical Technologies for Measurement, Sensors, and Microsystems, (26 August 1996); https://doi.org/10.1117/12.248506
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Cited by 6 scholarly publications.
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KEYWORDS
Photomasks

Lithography

Semiconducting wafers

Reticles

Photoresist processing

Standards development

Silicon

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