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Development of advanced process for halftone phase-shift mask fabrication with electron-beam exposure systems
Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure
Photomask blanks enhancement by optimizing resist baking and coating for advanced e-beam reticle fabrication
Pattern-data preparation method to enhance high-throughput mask fabrication in variable-shaped e-beam writing system
Evaluation of the MEBES 4500 reticle writer to commercial requirements of 250-nm design rule IC devices
New approach to phase metrology for manufacturing 248-nm lithography-based embedded attenuated phase-shifting mask