24 July 1996 Automatic photomask defect classification method
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Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245246
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan
Abstract
This paper describes a new image-processing algorithm for classifying photomask defects as pindots or contamination as a step toward automated inspection equipment for the one-micron generation. To detect contamination on quartz, our method extracts the gradient of the transmitted image within the dark region of reflected image. Contamination on the opaque membrane can also be detected by using the same method but with the transmitted image and reflected image mutually transposed. Standard particles of 0.3 to 0.5 micron can be detected with particles on quartz and particles on opaque membrane separated.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kyoji Yamashita, Kyoji Yamashita, Kazuto Matsuki, Kazuto Matsuki, Kiminobu Akeno, Kiminobu Akeno, } "Automatic photomask defect classification method", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245246; https://doi.org/10.1117/12.245246
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