24 July 1996 Detection and printability of random and programmed pinholes on Cr photomasks
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Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245244
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan
Abstract
In this paper, we describe pinhole detectivity using both pattern inspection and STARlight inspection. Examples of STARlight inspection of naturally-occurring pinholes are shown as well. Small pinholes are not be easily detected by pattern inspectors and are rarely detected by laser-based scatterometers. The construction of the programmed defect mask is described, and inspection tool performance on programmed defects is quantified. In addition, printability of selected defects is assessed by AIMS and correlated to inspection tool detectivity.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Franklin D. Kalk, Franklin D. Kalk, Anthony Vacca, Anthony Vacca, Charles H. Howard, Charles H. Howard, Linard Karklin, Linard Karklin, } "Detection and printability of random and programmed pinholes on Cr photomasks", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245244; https://doi.org/10.1117/12.245244
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