24 July 1996 Diamond membrane for x-ray lithography
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Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245216
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan
Abstract
Diamond membrane for X-ray lithography has been made by magnetically enhanced microwave chemical vapour deposition (CVD) technique, and evaluation of the membrane film has been carried out for various characteristics of X-ray mask requirements. Our diamond membrane has been found to have highly textured (1 1 1) poly crystalline with very little amount of non-diamond contents such as amorphous carbon and graphite, which suggests good mechanical strength, i.e., high durability against SR exposure with long lifetime and high Young's modulus required for accurate pattern positioning. We believe that our diamond membrane is suited for practical use in X-ray lithography.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hitoshi Noguchi, Hitoshi Noguchi, Meguru Kashida, Meguru Kashida, Yoshihiro Kubota, Yoshihiro Kubota, Takayuki Takarada, Takayuki Takarada, } "Diamond membrane for x-ray lithography", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245216; https://doi.org/10.1117/12.245216
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