24 July 1996 Die-to-database inspection of 256-Mb DRAM reticles
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Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245243
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan
256 Mbit DRAM devices pose a great challenge to the mask manufacturers. Shrinking kne widths, tighter CD requirements, new lithography enhancement techniques, dense data bases, and higher sensitMty to half-tone defects require advanced process and inspection systems. The improvements and changes in mask manufacturing are translated into three main characteristics of a dietodatabase inspection system: Image quality, reference data injection and defect detection. In order to meet the challenge of inspecting 256 Mbit DRAM masks various enhancements need to be implemented in die.. to-database inspection systems which bring the above characteristics to the required level and supply the mask maker with a highly reliable and sensitive tool.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yair Eran, Nissim Elmaliach, Yonatan Lehaman, Eyal Mizrahi, Gideon Rossman, "Die-to-database inspection of 256-Mb DRAM reticles", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245243; https://doi.org/10.1117/12.245243


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