24 July 1996 Die-to-database inspection of 256-Mb DRAM reticles
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Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245243
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan
256 Mbit DRAM devices pose a great challenge to the mask manufacturers. Shrinking kne widths, tighter CD requirements, new lithography enhancement techniques, dense data bases, and higher sensitMty to half-tone defects require advanced process and inspection systems. The improvements and changes in mask manufacturing are translated into three main characteristics of a dietodatabase inspection system: Image quality, reference data injection and defect detection. In order to meet the challenge of inspecting 256 Mbit DRAM masks various enhancements need to be implemented in die.. to-database inspection systems which bring the above characteristics to the required level and supply the mask maker with a highly reliable and sensitive tool.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yair Eran, Yair Eran, Nissim Elmaliach, Nissim Elmaliach, Yonatan Lehaman, Yonatan Lehaman, Eyal Mizrahi, Eyal Mizrahi, Gideon Rossman, Gideon Rossman, } "Die-to-database inspection of 256-Mb DRAM reticles", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245243; https://doi.org/10.1117/12.245243


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