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24 July 1996 Evaluation of the MEBES 4500 reticle writer to commercial requirements of 250-nm design rule IC devices
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Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245233
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan
Abstract
The design rule requirements and error budget allocation for maskmaking have made the mask a critical component in the fabrication of 250 nm design rule IC devices. The MEBES 4500 raster-scan reticle writer was designed to meet the mask requirements for pilot production of this generation of devices. In this paper, we will review the IC device and user requirements that drove the design criteria of the MEBES 4500 system. The architecture of the MEBES 4500 system is described and compared to these design criteria. MEBES 4500 perfonnance results during development, manufacture, and installation are also compared to the commercial requirements of 250 nm design rule ICs.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Frank E. Abboud, David W. Alexander, Thomas P. Coleman, Allen Cook, Leonard Gasiorek, Robert J. Naber, Frederick Raymond, and Charles A. Sauer "Evaluation of the MEBES 4500 reticle writer to commercial requirements of 250-nm design rule IC devices", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); https://doi.org/10.1117/12.245233
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