Fabrication of dense contact patterns using halftone phase-shifting mask with off-axis illumination

Hyoungjoon Kim; Jongwook Kye; Dae-Yup Lee; Sang-Gyun Woo; Hoyoung Kang; Young-Bum Koh

doi:10.1117/12.245224

24 July 1996 Fabrication of dense contact patterns using halftone phase-shifting mask with off-axis illumination

Hyoungjoon Kim, Jongwook Kye, Dae-Yup Lee, Sang-Gyun Woo, Hoyoung Kang, Young-Bum Koh

Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245224
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan

Abstract

We have investited the performance of the halftone phase-shifting mask (HT PSM) with various illuminations for contact patterns of different pitches in DUV photo lithography . It was found that illumination could be optimized as a function of the pitch. Highly coherent illumination was the best for isolated contact patterns but it was the worst for extremely dense contact patterns due to optical proximity effect and interference which occurred between the primary peaks and the secondary peaks of neighboring contact holes. For extremely dense contact patterns, off-axis illumination (OAI) was found to be the most appropriate compared to conventional illuminations because extremely dense contact patterns show the optical proximity effects which was observed similarly for equal line and space patterns. We found that HT PSM combined with OAI can be used for fabricating the extremely dense contact patterns of high density devices such as 256M and 1 G bit DRAM.

Citation Download Citation

Hyoungjoon Kim, Jongwook Kye, Dae-Yup Lee, Sang-Gyun Woo, Hoyoung Kang, and Young-Bum Koh "Fabrication of dense contact patterns using halftone phase-shifting mask with off-axis illumination", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); https://doi.org/10.1117/12.245224

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