Paper
24 July 1996 Investigation of phase-shift mask shifter defect printability and inspection techniques
Yasuhiro Koizumi, Daniel L. Lopez
Author Affiliations +
Abstract
Establishing an effective inspection method for PSM's shifter defects is a very important factor in successful production of PSM under i-line and DUV for 0.25 μm process rules. We have used a PSM with programmed shifter defects to confirm the minimum printable defect size under 0.25 μm rule process environment using i-line and DUV steppers. The same plate was then inspected by a special-detection experimental transmitted and reflected(ETR) and KLA3O1 D/D inspection system which KLA has developed in cooperation with Hitachi to evaluate its detection performance on those printable defects. We report that characteristic of this inspection system, which uses both transmitted and reflected light and special detection algorithm, is an effective tool. We will be able to supply defect free PSM for reliable process of 0.25 μm rule.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasuhiro Koizumi and Daniel L. Lopez "Investigation of phase-shift mask shifter defect printability and inspection techniques", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); https://doi.org/10.1117/12.245241
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KEYWORDS
Inspection

Deep ultraviolet

Defect detection

Phase shifts

Reticles

Critical dimension metrology

Photomasks

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