24 July 1996 New figure-fracturing algorithm for high-quality variable-shaped e-beam exposure data generation
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Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245230
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan
Abstract
We present a new figure fracturing algorithm that partitions each polygon in layout design data into trapezoids for vriab1eshaped EB exposure data generation. In order to improve the dimension accuracy of fabricated mask patterns created using the figure fracturing result, our algorithm has two new effective functions, one for suppressing narrow figure generation and the other for suppressing critical part partition. Furthermore, using a new graph based approach, our algorithm efficiently chooses from all the possible partitioning lines an appropriate set of lines by which optimal figure fracturing is performed. The application results show that the algorithm produces high quality results in a reasonable processing time.
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Hiroomi Nakao, Hiroomi Nakao, Koichi Moriizumi, Koichi Moriizumi, Kinya Kamiyama, Kinya Kamiyama, Masayuki Terai, Masayuki Terai, Hisaharu Miwa, Hisaharu Miwa, } "New figure-fracturing algorithm for high-quality variable-shaped e-beam exposure data generation", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245230; https://doi.org/10.1117/12.245230
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