24 July 1996 Performance of i- and g-line phase-shift measurement system MPM-100
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Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245227
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan
Abstract
The performance of an i-/g-line direct-phase measurement system Lasertec MPM- 100 has been evaluated. The minimum measurable pattern sizes is 2.5 .μm for holes on an 8%-i-line transmittance halftone phase shift masks (HPSMs). The effect of the focus position is not significant for hole pattern of above 3.5 μm. Both short-term repeatability and long-term stability are excellent, being less than 0.5 deg. The effect of the illumination NA has been investigated theoretically and experimentally, and the use of correction factors based on experiment is proposed for estimating effective phase shifts from phase shifts obtained by MPM- 100.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroshi Fujita, Hiroshi Fujita, Hisatake Sano, Hisatake Sano, Haruhiko Kusunose, Haruhiko Kusunose, Hideo Takizawa, Hideo Takizawa, Kouji Miyazaki, Kouji Miyazaki, Naoki Awamura, Naoki Awamura, Takahiro Ode, Takahiro Ode, Daikichi Awamura, Daikichi Awamura, } "Performance of i- and g-line phase-shift measurement system MPM-100", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); doi: 10.1117/12.245227; https://doi.org/10.1117/12.245227
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