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10 June 1996 Optical second-harmonic generation from ultrathin niobium films
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Proceedings Volume 2801, Nonlinear Optics of Low-Dimensional Structures and New Materials; (1996)
Event: International Conference on Coherent and Nonlinear Optics, 1995, St. Petersburg, Russian Federation
Experimental and theoretical investigations of the optical second-harmonic generation (SHG) from ultrathin niobium films embedded in a dielectric are presented. The dependence of the intensity of second-harmonic emission on the film thickness (in the range from 6 to 42 angstroms) and the angular dependencies of SHG are investigated for different polarization configurations. The thickness dependencies of the second-harmonic intensity reveal resonant behavior: the p(omega )-to-p2(omega ) second-harmonic intensity exhibits a pronounced maximum for a film thickness of approximately 15 angstroms while the s(omega )-to-p2(omega ) second-harmonic signal exhibits a step-like increase at the same thickness. By modeling the metal film as a symmetric quantum well, a microscopic local-field calculation of the second-harmonic generation is performed, and numerical results for the thickness and angular dependencies of the second-harmonic energy reflection coefficient are presented. Using simply infinite-barrier wave functions together with a self-field approximation the theoretical calculations qualitatively describe the observed thickness dependence of the second-harmonic generation which can be accounted for by the intersubband transitions in the quantum wells formed by the niobium films.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anatoly V. Zayats, Evgenyi A. Vinogradov, Ole Keller, Kjeld Pedersen, Ansheng Liu, and Fedor A. Pudonin "Optical second-harmonic generation from ultrathin niobium films", Proc. SPIE 2801, Nonlinear Optics of Low-Dimensional Structures and New Materials, (10 June 1996);

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