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19 July 1996 EUV spectrometric facility with laser-focus plasma radiation source
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A spectrometric facility for measurements of reflection, absorption and excitation spectra of films and massive samples in 50 to 300 nm wavelength region with the spectral resolution up to 103 is designed and tested. Plasma produced EUV radiation from the laser beam focused onto a gaseous or a solid target makes it possible to achieve the spectral intensity on a sample up to 3(DOT)106 photons/s(DOT)cm-1. Application to measurement of reflection spectra of some phthalocynines is reported here.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Valeri O. Papanyan and Gagik Ts. Nersisyan "EUV spectrometric facility with laser-focus plasma radiation source", Proc. SPIE 2805, Multilayer and Grazing Incidence X-Ray/EUV Optics III, (19 July 1996);

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