Grazing incidence hard x-ray multilayer structures require the capability to deposit ultra-thin (of the order of monolayers, i.e. single angstrom), ultra-smooth (of the order of an angstrom rms value), uniform, alternating films of high Z and low Z materials, with sharp interfaces and no interdiffusion between the layers. Vapor phase deposition processes such as evaporation and sputtering can not achieve all the above goals. We have developed a new deposition process which does not involve the use of vacuum, is performed at a low temperature, can be scaled up to large surface areas and to curved substrates, is low cost, and results in ultra thin (monolayers), ultra smooth, uniform, high density films with sharp interfaces. This is optimal for the construction of multilayer x-ray optical components. Multilayer structures of various High Z/ low Z materials were deposited using our new deposition process. The surface characterization and x-ray reflectivity of these multilayer structures are presented.