Visit My Account to manage your email alerts.
Performance of the VUV high-resolution and high-flux beamline for chemical dynamics studies at the Advanced Light Source
Monolithic silicon x-ray interferometer with varying mirror-analyzer spacing for the analysis of beam coherence
Elliptically polarizing undulator beamline 4.0.1 for magnetic spectroscopy at the Advanced Light Source
Design of a high-resolution step-and-scan type monochromator capable of tuning to undulator radiation over a wavelength range of 80-180 nm
Ultraprecision grinding of chemical vapor deposited silicon carbide mirrors for synchrotron radiation
Preliminary optical design of a varied line-space spectrograph for the multichannel detection of near-edge x-ray absorption fine structure (NEXAFS) spectra in the 280- to 550-eV energy range