11 November 1996 Polishability of CERAFORM silicon carbide
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Abstract
Recent advances in polishing the bare CERAFORM SiC surface to finishes as smooth as 1OA rms has enhanced the viability of SiC as a mirror material those applications requiring thermal stability over a broad temperature range. In addition PVD silicon claddings have been developed to provide a low cost polishing option for more environments which are less severe. With the ability to make complex shapes in sizes up to 1 meter, CERAFORM SiC provides a cost-effective alternative to beryllium and glass.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mark A. Ealey, John A. Wellman, "Polishability of CERAFORM silicon carbide", Proc. SPIE 2857, Advanced Materials for Optical and Precision Structures, (11 November 1996); doi: 10.1117/12.258290; https://doi.org/10.1117/12.258290
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KEYWORDS
Silicon carbide

Silicon

Polishing

Surface finishing

Mirrors

Diamond

Abrasives

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