25 October 1996 Improved resolution in field-emission lithography machines
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Abstract
The electron-optical design of the Leica Vectorbeam Series lithography tool has been modified to reduce the writing spot-size to 2.5 nm; this has required two separate design approaches. Firstly, the current transmitted from the Schottky-emission source module into the column has been reduced from 500 to 25 nA. This makes stochastic beam broadening due to electron-electron interactions negligible. Secondly, a new final lens was designed with sufficiently small aberrations to achieve the desired spot-size. The design includes secondary electron detectors as well as the more usual back-scattered electron detectors. The conversion of the theoretical electron-optical design to reality has been greatly facilitated by the use of CAD solid modelling techniques.
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Tom Chisholm, Bernard A. Wallman, Haoning Liu, Eric Munro, John A. Rouse, Xieqing Zhu, "Improved resolution in field-emission lithography machines", Proc. SPIE 2858, Charged-Particle Optics II, (25 October 1996); doi: 10.1117/12.255505; https://doi.org/10.1117/12.255505
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