1 November 1996 Investigation of superthin carbon layers and multilayer carbon structures by x-ray reflectivity measurements
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In situ x-ray monitoring of reflectivity in the short range 0.05 - 0.3 nm for investigation of thin carbon layers and multilayer carbon structures is proposed. X-ray monitoring is based on periodical alternations of Fresnel's reflectivity when layer thickness increases or decreases. The source of x rays with wavelength 0.154 nm was located out of working volume of installation and consisted of x-ray tube, monochromator block and collimating system. The objects of in-situ investigations were carbon films obtained by rf-plasma discharge and magnetron methods. Multilayer carbon structures were synthesized by alternating these layers. Density and microroughness of the growing film were determined for every half-wave of reflectivity oscillations that corresponds to averaging by the layer of 1.0 nm thickness. It is shown that x-ray monitoring system permits the user to control the layers thickness during multilayer structure growth with precision up to 0.1 nm.
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Alexander M. Baranov, Alexander M. Baranov, Sergei A. Tereshin, Sergei A. Tereshin, Igor Fedorovich Mikhailov, Igor Fedorovich Mikhailov, V. I. Pinegin, V. I. Pinegin, "Investigation of superthin carbon layers and multilayer carbon structures by x-ray reflectivity measurements", Proc. SPIE 2863, Current Developments in Optical Design and Engineering VI, (1 November 1996); doi: 10.1117/12.256242; https://doi.org/10.1117/12.256242

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