31 December 1996 Analysis of near-field light intensity
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Proceedings Volume 2866, International Conference on Holography and Optical Information Processing (ICHOIP '96); (1996) https://doi.org/10.1117/12.263073
Event: International Conference on Holography and Optical Information Processing, 1996, Nanjing, China
Abstract
In this paper a numerical simulation is used to calculate near-field intensity by `split light beam.' The calculation proves to be valid as we apply it to the plane wave. In the case of one dimension structure such as a compact disk sample, the near-field intensity profiles show a rather complicated structure. In many cases the near-field intensity does not represent the actual surface profile. The near-field intensity is strongly modulated by the surface structure. When the distance between the sample and the probe becomes larger, some subtle perturbation is added to the intensity profile, and a shift between the surface and the intensity profile became more clear. The shift may cause some problems when we use the optical probe as a multi- function probe to do some lithograph work or to position. In this paper, a comparison between the calculation and experiment results was made.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Keyi Wang, Keyi Wang, Zhen Jin, Zhen Jin, Wenhao Huang, Wenhao Huang, } "Analysis of near-field light intensity", Proc. SPIE 2866, International Conference on Holography and Optical Information Processing (ICHOIP '96), (31 December 1996); doi: 10.1117/12.263073; https://doi.org/10.1117/12.263073
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