20 November 1996 Characterization of excimer laser beam parameters
Author Affiliations +
Proceedings Volume 2870, Third International Workshop on Laser Beam and Optics Characterization; (1996) https://doi.org/10.1117/12.259920
Event: Third International Workshop on Laser Beam and Optics Characterization, 1996, Quebec City, Canada
Abstract
A laboratory system for comprehensive characterization of excimer laser beam parameters in both near- and far-field is presented, along with a description of calibration procedures for spatially resolving UV detectors which were tested with respect to linearity, sensitivity, uniformity and stability. The investigations also comprise improvements in the standardized evaluation of beam characteristics. A semi-analytical method for accurate background substraction based on the requirement that the integral pulse energy must not depend on the size of the integration area is described. This algorithm allows high-precision determination of beam diameters for both 'moving slit' and 'second moment' methods. Definitions for unambiguous evaluation of relevant excimer laser beam properties like plateau uniformity and edge steepness of homogenized profiles are proposed.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Klaus R. Mann, J. Ohlenbusch, Volker Westphal, "Characterization of excimer laser beam parameters", Proc. SPIE 2870, Third International Workshop on Laser Beam and Optics Characterization, (20 November 1996); doi: 10.1117/12.259920; https://doi.org/10.1117/12.259920
PROCEEDINGS
11 PAGES


SHARE
Back to Top