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20 November 1996 Laser beam characteristics related to the design of a system to improve engraving process
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Proceedings Volume 2870, Third International Workshop on Laser Beam and Optics Characterization; (1996) https://doi.org/10.1117/12.259925
Event: Third International Workshop on Laser Beam and Optics Characterization, 1996, Quebec City, Canada
Abstract
Laser beam characteristics related with the design of laser engraving systems combining scanning of a material surface together with mask projection techniques are studied in this paper. The laser beam intensity distributions have been displayed for different positions of the mask in the optical device, showing the ranges of movement at which it is possible to work with a high reliability of this type of laser systems. The concept of an effective circle of confusion from optical imaging is applied for determining a good image formation in laser engraving systems.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rafael Estrela, Jose Antonio Ramos de Campos, and Juan Carlos Soriano "Laser beam characteristics related to the design of a system to improve engraving process", Proc. SPIE 2870, Third International Workshop on Laser Beam and Optics Characterization, (20 November 1996); https://doi.org/10.1117/12.259925
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