16 August 1996 Ellipsometric study of rare gas films physisorbed on a surface of a metal single crystal
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Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246227
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan
Abstract
We have developed a new experimental equipment for the ellipsometric study of a physisorption system on a surface of a metal single crystal; a vacuum chamber with an ultimate pressure of 10-9 Pa, a substrate temperature between 40 K and 1000 K, and the automatic null ellipsometer. The adsorption isotherms of Xe/Ag(111) at temperatures between 60 K and 80 K were obtained in the wide pressure range between 10-7 Pa and 10-1 Pa. We found that this ellipsometer made it possible to observe layer growth of a van der Waals condensate from a submonolayer range to a thick layer where equilibrium pressure was nearly equal to the bulk saturation vapor pressure of the adsorbate.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sin-ichi Igarashi, Takato Hirayama, Ichiro Arakawa, Yukio Abe, "Ellipsometric study of rare gas films physisorbed on a surface of a metal single crystal", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); doi: 10.1117/12.246227; https://doi.org/10.1117/12.246227
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