16 August 1996 Ellipsometric topometry for technical surfaces
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Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246211
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan
Abstract
In our contribution we describe a novel application of reflection ellipsometry to surface measurement. Not only the refractive index of the surface material but also the deterministic surface structure is concluded from the ellipsometric parameters (Delta) , (Psi) , and p. To achieve this, we here proposed two novel procedures: (1) the ellipsometric differential topometry and (2) the ellipsometric reference film method. The required measurement setup is described. To measure the ellipsometric parameters we developed a novel measurement procedure. Results of preliminary experiments are presented.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wolfgang Holzapfel, Wolfgang Holzapfel, Ulrich Neuschaefer-Rube, Ulrich Neuschaefer-Rube, Jochen Doberitzsch, Jochen Doberitzsch, } "Ellipsometric topometry for technical surfaces", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); doi: 10.1117/12.246211; https://doi.org/10.1117/12.246211
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