16 August 1996 First thin film ellipsometry at a photon energy of 97eV with use of high-performance multilayer polarizers
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Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246183
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan
Abstract
In the extreme ultraviolet (EUV) region, synthetic multilayer structures are found useful as reflection polarizers. Such structures of transmission type made by removing from substrates are found useful as polarizers and phase shifters. With these multilayer polarizing elements developed, the first thin ellipsometry was performed at a photon energy of 97 eV (12.8 nm in wavelength), which demonstrated atomic sensitivity of the EUV ellipsometry.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masaki Yamamoto, Masaki Yamamoto, K. Mayama, K. Mayama, Hidekazu Kimura, Hidekazu Kimura, Minaji Furudate, Minaji Furudate, Mihiro Yanagihara, Mihiro Yanagihara, } "First thin film ellipsometry at a photon energy of 97eV with use of high-performance multilayer polarizers", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); doi: 10.1117/12.246183; https://doi.org/10.1117/12.246183
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