Heterodyne interferometer for film thickness and refractive index measurements of optical thin film

Nobuhiro Shimizu; Junya Yuguchi; Hideo Takahashi

doi:10.1117/12.246196

16 August 1996 Heterodyne interferometer for film thickness and refractive index measurements of optical thin film

Nobuhiro Shimizu, Junya Yuguchi, Hideo Takahashi

Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246196
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan

Abstract

An optical heterodyne interferometer that uses various laser beams was constructed using two acousto-optic tunable filters with slightly different frequencies of the diffracted light. A film thickness and refractive index of a SiO₂ thin-film on the Si substrate were measured by varying the wavelength using this apparatus.

Citation Download Citation

Nobuhiro Shimizu, Junya Yuguchi, and Hideo Takahashi "Heterodyne interferometer for film thickness and refractive index measurements of optical thin film", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); https://doi.org/10.1117/12.246196

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