16 August 1996 Heterodyne interferometer for film thickness and refractive index measurements of optical thin film
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Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246196
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan
Abstract
An optical heterodyne interferometer that uses various laser beams was constructed using two acousto-optic tunable filters with slightly different frequencies of the diffracted light. A film thickness and refractive index of a SiO2 thin-film on the Si substrate were measured by varying the wavelength using this apparatus.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nobuhiro Shimizu, Nobuhiro Shimizu, Junya Yuguchi, Junya Yuguchi, Hideo Takahashi, Hideo Takahashi, } "Heterodyne interferometer for film thickness and refractive index measurements of optical thin film", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); doi: 10.1117/12.246196; https://doi.org/10.1117/12.246196
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