16 August 1996 Heterodyne interferometer for film thickness and refractive index measurements of optical thin film
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Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246196
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan
Abstract
An optical heterodyne interferometer that uses various laser beams was constructed using two acousto-optic tunable filters with slightly different frequencies of the diffracted light. A film thickness and refractive index of a SiO2 thin-film on the Si substrate were measured by varying the wavelength using this apparatus.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nobuhiro Shimizu, Nobuhiro Shimizu, Junya Yuguchi, Junya Yuguchi, Hideo Takahashi, Hideo Takahashi, "Heterodyne interferometer for film thickness and refractive index measurements of optical thin film", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); doi: 10.1117/12.246196; https://doi.org/10.1117/12.246196
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