16 August 1996 In-situ monitor and control using fast spectroscopic ellipsometry
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Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246202
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan
Abstract
A four gun magnetron sputter deposition chamber equipped with in-situ spectroscopic ellipsometry is described, and the results of precisely controlled multilayered metallic and dielectric materials are reported. These structures have applications in magneto-optic memories, as well as giant magneto resistance and spin-valve magnetic read-heads.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John A. Woollam, Xiang Gao, Scott Heckens, James N. Hilfiker, "In-situ monitor and control using fast spectroscopic ellipsometry", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); doi: 10.1117/12.246202; https://doi.org/10.1117/12.246202
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