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16 August 1996In-situ monitor and control using fast spectroscopic ellipsometry
A four gun magnetron sputter deposition chamber equipped with in-situ spectroscopic ellipsometry is described, and the results of precisely controlled multilayered metallic and dielectric materials are reported. These structures have applications in magneto-optic memories, as well as giant magneto resistance and spin-valve magnetic read-heads.
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John A. Woollam, Xiang Gao, Scott Heckens, James N. Hilfiker, "In-situ monitor and control using fast spectroscopic ellipsometry," Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); https://doi.org/10.1117/12.246202