16 August 1996 In-situ monitor and control using fast spectroscopic ellipsometry
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Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246202
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan
Abstract
A four gun magnetron sputter deposition chamber equipped with in-situ spectroscopic ellipsometry is described, and the results of precisely controlled multilayered metallic and dielectric materials are reported. These structures have applications in magneto-optic memories, as well as giant magneto resistance and spin-valve magnetic read-heads.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John A. Woollam, John A. Woollam, Xiang Gao, Xiang Gao, Scott Heckens, Scott Heckens, James N. Hilfiker, James N. Hilfiker, } "In-situ monitor and control using fast spectroscopic ellipsometry", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); doi: 10.1117/12.246202; https://doi.org/10.1117/12.246202
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