Measurement of low-level strain birefringence in optical elements using a photoelastic modulator

Theodore C. Oakberg

doi:10.1117/12.246208

16 August 1996 Measurement of low-level strain birefringence in optical elements using a photoelastic modulator

Theodore C. Oakberg

Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246208
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan

Abstract

Measurements of low levels of strain birefringence in fused silica glass have been made using a system based on a photoelastic modulator. Measurements of sample net retardation have been made with a resolution of 0.1 nanometers. Measured values of a strain birefringence constant for fused silica are in good agreement with established data.

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Theodore C. Oakberg "Measurement of low-level strain birefringence in optical elements using a photoelastic modulator", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); https://doi.org/10.1117/12.246208

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