Photolithography equipment control through D-optimal design

Alain B. Charles; Yves Chandon; Francois Bergeret; Les Garcia

doi:10.1117/12.250916

13 September 1996 Photolithography equipment control through D-optimal design

Alain B. Charles, Yves Chandon, Francois Bergeret, Les Garcia

Proceedings Volume 2876, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II; (1996) https://doi.org/10.1117/12.250916
Event: Microelectronic Manufacturing 1996, 1996, Austin, TX, United States

Abstract

In a large manufacturing environment, one of the process engineer's tasks is to ensure that all the equipment and its associated processes are well under control. This is usually achieved by running a daily monitor test on each single piece of equipment. Unfortunately, this leads to a large number of test wafer usages and becomes very time consuming if an out of control situation is detected. Things get even more complicated when the overall process is done by adding several individual processes, since the result of the test on one equipment depends on how well another one did perform. In such case, false alarms might happen and the wrong process or equipment shut down. Therefore, a need for a more reliable method must be proposed. This paper intends to describe one possible solution, and the first results of its implementation in the photolithography area.

Citation Download Citation

Alain B. Charles, Yves Chandon, Francois Bergeret, and Les Garcia "Photolithography equipment control through D-optimal design", Proc. SPIE 2876, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II, (13 September 1996); https://doi.org/10.1117/12.250916

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