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23 September 1996 Approach for semicustom integrated-sensor system manufacturing in a commercial CMOS technology
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Proceedings Volume 2879, Micromachining and Microfabrication Process Technology II; (1996) https://doi.org/10.1117/12.251220
Event: Micromachining and Microfabrication '96, 1996, Austin, TX, United States
Abstract
In this work the development of a design and manufacturing methodology for application-specific integrated sensor systems in silicon, that extends the ASIC standard cell approach for circuits, is presented. The standard design environment of a commercial foundry is used. A library of micromachined sensors and specific interface circuit cells has been added to the foundry's libraries. A fabrication structure has been set up in which the CMOS foundry process is followed by a micromachining post-processing transparent to the user. This includes back-side membrane fabrication. A number of standard sensor cell types have been developed: ISFET chemical sensors, gas flow and infrared radiation sensors based on thermopiles and piezoresistive pressure sensors. Mass-beam structures suitable for accelerometer devices have also been fabricated.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joan Bausells "Approach for semicustom integrated-sensor system manufacturing in a commercial CMOS technology", Proc. SPIE 2879, Micromachining and Microfabrication Process Technology II, (23 September 1996); https://doi.org/10.1117/12.251220
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