23 September 1996 Chemical-mechanical polishing: enhancing the manufacturability of MEMS
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Proceedings Volume 2879, Micromachining and Microfabrication Process Technology II; (1996) https://doi.org/10.1117/12.251237
Event: Micromachining and Microfabrication '96, 1996, Austin, TX, United States
Abstract
The planarization technology of chemical-mechanical- polishing (CMP), used for the manufacturing of multilevel metal interconnects for high-density integrated circuits, is also readily adaptable as an enabling technology in micro- electro-mechanical systems (MEMS) fabrication, particularly polysilicon surface micromachining. CMP not only eases the design and manufacturability of MEMS devices by eliminating several photolithographic and film issues generated by severe topography, but also enables far greater flexibility with process complexity and associated designs. Thus, the CMP planarization technique alleviates processing problems associated with fabrication of multilevel polysilicon structures, eliminates design constraints linked with non- planar topography, and provides an avenue for integrating different process technologies. Examples of these enhancements include: a simpler extension of surface micromachining fabrication to multiple mechanical layers, a novel method of monolithic integration of electronics and MEMS, and a novel combination of bulk and surface micromachining.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jeffry J. Sniegowski, "Chemical-mechanical polishing: enhancing the manufacturability of MEMS", Proc. SPIE 2879, Micromachining and Microfabrication Process Technology II, (23 September 1996); doi: 10.1117/12.251237; https://doi.org/10.1117/12.251237
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