23 September 1996 Release-etch modeling for complex surface-micromachined structures
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Proceedings Volume 2879, Micromachining and Microfabrication Process Technology II; (1996) https://doi.org/10.1117/12.251224
Event: Micromachining and Microfabrication '96, 1996, Austin, TX, United States
A release etch model for etching sacrificial oxides in aqueous HF solutions is presented. This model is an extension of work done by Monk et. al. and Liu et. al The model is inherently one dimensional, but can be used to model the etching of complex three dimensional parts. Solutions and boundary conditions are presented for a number of geometries.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
William P. Eaton, William P. Eaton, James H. Smith, James H. Smith, Robert L. Jarecki, Robert L. Jarecki, "Release-etch modeling for complex surface-micromachined structures", Proc. SPIE 2879, Micromachining and Microfabrication Process Technology II, (23 September 1996); doi: 10.1117/12.251224; https://doi.org/10.1117/12.251224

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