Temperature rise in thick PMMA resists during x-ray exposure

Harish M. Manohara; Gina M. Calderon; J. Michael Klopf; Kevin J. Morris; Olga Vladimirsky; Yuli Vladimirsky

doi:10.1117/12.250950

13 September 1996 Temperature rise in thick PMMA resists during x-ray exposure

Harish M. Manohara, Gina M. Calderon, J. Michael Klopf, Kevin J. Morris, Olga Vladimirsky, Yuli Vladimirsky

Proceedings Volume 2880, Microlithography and Metrology in Micromachining II; (1996) https://doi.org/10.1117/12.250950
Event: Micromachining and Microfabrication '96, 1996, Austin, TX, United States

Abstract

Temperature measurements of thick PMMA resist during X-ray (1 to 5 keV) exposure are presented in this paper. Thin metal (gold) film thermal sensors were fabricated directly on the resist surface and on the resist/substrate interface using micro-lithography methods. The temperature measurements were conducted in vacuum (< 10^-4 Torr) and in 1 to 25 Torr helium pressure--conditions corresponding to typically X-ray lithography exposure. The results of temperature rise measurements performed with thermal sensors and with miniature conventional thermocouples are compared.

Citation Download Citation

Harish M. Manohara, Gina M. Calderon, J. Michael Klopf, Kevin J. Morris, Olga Vladimirsky, and Yuli Vladimirsky "Temperature rise in thick PMMA resists during x-ray exposure", Proc. SPIE 2880, Microlithography and Metrology in Micromachining II, (13 September 1996); https://doi.org/10.1117/12.250950

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