17 September 1996 Micromachined rotating yaw-rate sensor
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Proceedings Volume 2882, Micromachined Devices and Components II; (1996) https://doi.org/10.1117/12.250700
Event: Micromachining and Microfabrication '96, 1996, Austin, TX, United States
This paper describes a novel, electromagnetically levitated, micromachined gyroscope or yaw rate sensor. The device uses a rotor spun at high speed and has the potential for several orders of magnitude improvement in yaw rate sensitivity when compared to other micromachined sensors. The first prototype rotates at just over 1,000 revolutions per minute, with a predicted sensitivity of approximately 0.5 degrees per second. The model indicates that this rotation speed may be increased by orders of magnitude, with corresponding increases in the sensitivity, as the speed of rotation is only limited by the drag force in air. The device also has the advantage that it is extremely simple to fabricate.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert B. Yates, Robert B. Yates, Connel B. Williams, Connel B. Williams, Chris Shearwood, Chris Shearwood, Phillip Mellor, Phillip Mellor, } "Micromachined rotating yaw-rate sensor", Proc. SPIE 2882, Micromachined Devices and Components II, (17 September 1996); doi: 10.1117/12.250700; https://doi.org/10.1117/12.250700

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